ES-Tenso Ellipsometer
Advanced spectroscopic ellipsometer with full 4×4 Mueller matrix measurement. Broadband light source with polarization modulation acquires Psi/Delta parameters and Mueller matrix, outputting film thickness, refractive index n, extinction coefficient k, and dielectric constant ε through iterative fitting — fully automated.
- 4×4 Full Mueller matrix measurement
- Simultaneously outputs thickness, n, k, and ε
- Built-in optical models and material library
- Fully automated from acquisition to parameter extraction
- Reflection and transmission detection modes
ES-Primo Ellipsometer
High-end spectroscopic ellipsometer using advanced polarization modulation technology, suitable for precise measurement of nanometer-level thin films. Can simultaneously measure film thickness and optical constants (n, k), providing the most accurate data for scientific research. Successfully applied in multiple research projects.
- Nanometer-level accuracy, thickness measurement accuracy ±0.01nm
- Ellipsometry technology, can measure thickness and optical constants simultaneously
- Multi-layer film analysis, supports up to 50 layers
- High-end research applications, suitable for semiconductor, optics, materials science fields
- Can be combined with AFM, Raman spectroscopy and other techniques
NS-20 Manual Film Thickness Gauge
A reflective micro film thickness measurement and analysis system independently developed by Acuitik, using white light interference technology to achieve non-contact, non-destructive nanometer-level film thickness measurement. Suitable for laboratory research environments, providing comprehensive solutions from basic research to cutting-edge exploration.
- Measurement range: 10nm - 200μm (extendable to 1000μm)
- Measurement accuracy: ±0.1nm (single layer), ±0.5nm (multi-layer)
- Repeatability: 0.01nm (100 measurements standard deviation)
- Supports up to 50-layer film analysis
- Portable design, suitable for laboratory research environments
NS-Vista Dual Channel
Dual-channel high-precision film thickness measurement system, using dual optical path design to simultaneously perform reference measurement and sample measurement, significantly improving measurement accuracy and stability. Suitable for complex multi-layer film research analysis.
- Dual channel design, reference channel and measurement channel independent
- High precision measurement, accuracy up to ±0.05nm
- Multi-layer film analysis, supports up to 50 layers
- Measurement range: 10nm - 200μm
- Supports simultaneous measurement of optical constants (n, k)
NS-Flex Portable Multi-Modal
Portable multi-modal film thickness measuring instrument, integrating multiple measurement modes, suitable for various research scenarios. From laboratory to field, from basic research to application exploration, providing flexible measurement solutions.
- Portable design, supports both handheld and desktop modes
- Multi-modal measurement, supports reflection, transmission, ellipsometry and other modes
- High precision research-grade, accuracy up to ±0.1nm
- Measurement range: 10nm - 200μm
- Supports up to 50-layer film analysis