High-precision manual film thickness measurement equipment designed specifically for laboratory R&D, supporting UV, visible, near-infrared multi-band configuration, meeting various thin film measurement needs.
NS-20 integrates multiple core technologies from Acuitik, providing you with excellent measurement experience
Measurement accuracy up to ±0.5nm, meeting precise R&D requirements
Single point measurement in just 1 second, supporting rapid scanning of batch samples
Built-in AI algorithm (optional), automatic thin film model fitting, measurement speed up to 1000 points/second or more
Supports analysis of up to 100 layers of films, suitable for complex multi-layer film structures
NS-20 series offers three wavelength models, supporting flexible combinations to meet measurement needs in different application scenarios
UV Wavelength Exclusive
Standard General Purpose
Near-Infrared Wavelength Exclusive
Different wavelength models can be freely combined to provide broader measurement capabilities
Deep UV Enhanced
Near-Infrared Extended
Covering 190 nm - 1700 nm ultra-wide spectral range
Simultaneously meeting UV, visible, near-infrared thin film measurement needs
Professional-grade configuration to meet various film measurement needs
Widely used in various film thickness measurement fields
Thin film process monitoring and quality control in semiconductor wafer manufacturing
Quality inspection of anti-reflection, high-reflection, and filter coatings
Solar cell thin film measurement and performance evaluation
OLED, LCD panel coating measurement and process control
New material film thickness characterization in universities and research institutes
Film thickness quality control in various industrial production lines
Contact us now to learn more about how NS-20 can help with your film thickness measurement needs