High-End Research-Grade Spectroscopic Ellipsometer

ES-Primo
Ellipsometer

High-end spectroscopic ellipsometer using advanced polarization modulation technology, suitable for precise measurement of nanometer-level thin films. Can simultaneously measure film thickness and optical constants (n, k), providing the most accurate data for scientific research.

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Core Features

ES-Primo spectroscopic ellipsometer integrates multiple innovative technologies from Acuitik, providing the most accurate film measurement solutions for research users

Nano-level Precision

Thickness measurement accuracy up to ±0.01nm, optical constant accuracy ±0.001, meeting the most demanding research requirements

Dual Parameter Measurement

Can simultaneously measure film thickness and optical constants (n, k), providing more comprehensive data support for material research

Fast Measurement

Single point measurement in just 1 second, supporting fast mapping measurement of large-area samples

System Integration

Can be integrated with AFM, Raman spectroscopy, cryogenic systems and other equipment to meet diverse research needs

Technical Specifications

Detailed technical specifications of ES-Primo spectroscopic ellipsometer

Parameter	Specification
Model	Primo UVX (optional other wavelength bands)
Wavelength Range	190 nm – 1700 nm
Angle of Incidence	45-90 degree
Thickness Measurement Range	0.01 nm – 50 μm
Accuracy (SiO2 on Si)	± 1.5Å or 0.2%
Static Repeatability 1σ	0.1Å or 0.01%
Refractive Index Accuracy	≤±0.005 (SiO2 on Si)
Refractive Index Static Repeatability 1σ	≤0.0005 (SiO2 on Si)
Spot Size	Standard measurement spot 2mm, optional small spot range 50 μm – 400 μm
Measurement Speed	< 10s (single measurement) (optional fast measurement available, as fast as 1s)
Light Source	Tungsten-halogen lamp + Deuterium lamp
Sample Size	Diameter from 1mm to 300mm or larger
Sample Thickness	Supports 0.1mm ≤ t ≤ 6mm (customizable)
Sample Stage Configuration	Signal-assisted leveling, adjustable Z-axis height, adjustable sample stage tilt
Material Library	Over 100 built-in materials, including Cauchy, Cauchy Urbach, Lorentz, Sellmeier, Harmonic Oscillator, Tauc-Lorentz, Drude, Gaussian, EMA, Multi-oscillator models. Oscillator models can be opened up by the software.

Application Scenarios

ES-Primo Ellipsometer is widely used in various scientific research fields, providing precise film measurement solutions for materials science research

Semiconductor Research

Measuring ultra-thin layer thickness and optical constants in advanced semiconductor devices such as high-k gate dielectrics, FinFET structures, and 3D NAND.

2D Materials

Measuring layer number and thickness of graphene, transition metal dichalcogenides, MXene and other 2D materials, supporting large-area mapping.

Optical Thin Films

Measuring film thickness and optical constants of AR/HR coatings, filters, beam splitters and other optical components, supporting multi-layer analysis.

Biomaterials

Measuring thickness and optical properties of biomembranes, protein adsorption layers, cell culture substrates and other biomaterials, supporting in-situ measurement.

New Energy Materials

Measuring functional film thickness and optical properties in solar cells, lithium batteries, fuel cells and other new energy devices.

Fundamental Physics Research

Researching dielectric functions, band structures, plasmon resonances and other fundamental physical properties of materials, supporting variable temperature and field measurements.

ES-PrimoEllipsometer