AlN 折射率

AlN 的光学常数 (n, k) 数据，涵盖 0.21 – 1.69 μm 波长范围。

波长范围 0.211 – 1.688 μm
数据点 697

关键波长处的光学常数

632.8 nm (He-Ne)
n = 2.0477
k = 0.0004
589.3 nm (Na-D)
n = 2.0536
k = 0.0005
532 nm
n = 2.0641
k = 0.0007
1550 nm (通讯)
n = 2.0180
k = 0.0001

n, k 色散曲线

数据表（采样）

波长 (μm) n k
0.21142.570240.12237
0.23832.405430.04674
0.26522.303270.02169
0.29222.236060.01159
0.31912.189680.00688
0.34612.156410.00443
0.37312.131770.00304
0.40012.113020.00219
0.42712.098420.00165
0.45412.086830.00128
0.48122.077470.00103
0.50822.069810.00084
0.53522.063450.00070
0.56232.058120.00060
0.58932.053590.00052
0.61632.049720.00045
0.64332.046390.00040
0.67032.043490.00036
0.69722.040960.00032
0.72412.038740.00029
0.75112.036770.00027
0.77802.035020.00025
0.80482.033460.00023
0.83162.032060.00021
0.85842.030800.00020
0.88522.029660.00019
0.91192.028630.00017
0.93862.027690.00017
0.96522.026840.00016
0.99182.026050.00015
1.04802.024600.00014
1.10582.023340.00012
1.16392.022270.00011
1.22202.021350.00011
1.28022.020550.00010
1.33862.019860.00009
1.39712.019250.00009
1.45582.018720.00008
1.51462.018250.00008
1.57352.017830.00008
1.63252.017450.00007
1.68822.017140.00007

上表为采样数据（共 697 个数据点），点击"下载完整 CSV"获取全部数据。

数据说明

303 nm thick aluminum nitride (AlN) film deposited by reactive sputtering.

参考文献

1) L. Yu. Beliaev, E. Shkondin, A. V. Lavrinenko, O. Takayama. Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths. J. Vac. Sci. Technol. A 39, 043408 (2021)
2) L. Yu. Beliaev, E. Shkondin, A. V. Lavrinenko, O. Takayama. Erratum: Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths [J. Vac. Sci. Technol. A 39, 043408 (2021)]. J. Vac. Sci. Technol. A 40, 027001 (2022) (Numerical data kindly provided by Osamu Takayama)

相关材料（主要）

Ag Ag3AsS3 (e) Ag3AsS3 (o) AgBr AgCl AgGaS2 (e)

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