Precision Insight
Beyond Limits

Reflectometric film thickness measurement is based on the principle of optical interference. When light hits a thin film surface, part of the light reflects from the upper surface while another part penetrates the film and reflects from the lower surface. The two reflected beams produce interference due to optical path difference. By analyzing the characteristic peak positions and intensities of the interference spectrum, the film thickness can be precisely calculated. Acuitik uses advanced white light interferometry combined with proprietary inversion algorithms to achieve sub-nanometer accuracy.

Acuitik's film thickness measurement equipment can measure films from a few nanometers to several millimeters. For common semiconductor thin films, optical coatings, and nanoscale coatings, measurement accuracy can reach within 0.1 nanometer. The NS-30 series equipped with high-sensitivity spectrometers can precisely measure ultra-thin films (such as photoresist, oxide layers, etc.), with minimum measurable thickness as low as 10 nanometers.

Our equipment can measure various thin film materials, including but not limited to: semiconductor thin films (silicon, silicon nitride, silicon oxide), optical thin films (anti-reflection coatings, reflective coatings, filters), metal thin films (aluminum, copper, gold, silver), polymer thin films, photoresist coatings, and various composite thin films. Best results are achieved for transparent or semi-transparent thin films, though some metal thin films can also be measured.

No. Reflectometric film thickness measurement uses non-contact optical measurement methods. The measurement probe maintains a certain distance from the sample surface, measuring through the optical system. This method does not cause any damage or contamination to the sample, making it especially suitable for fragile samples, valuable devices, and applications requiring surface cleanliness.

Ellipsometry is a precision optical measurement technology that utilizes the interaction characteristics of polarized light with thin films. When polarized light incidents on a thin film surface, the film's reflection and transmission cause changes in polarization state (from linear polarization to elliptical polarization). By precisely measuring these polarization state changes, the film's thickness, refractive index and other parameters can be calculated. Acuitik's ES-Primo series ellipsometers use advanced multi-wavelength measurement technology, especially suitable for ultra-thin films and complex multi-layer film structures.

The two technologies apply to different scenarios. Reflectometers are based on white light interferometry principles, with simple structure and fast measurement speed, suitable for measuring transparent or semi-transparent thin film thickness with good robustness to optical parameters. Ellipsometers measure polarization state changes with higher sensitivity and can simultaneously obtain more parameters such as thickness and refractive index, especially suitable for ultra-thin films (nanoscale and below), multi-layer film structures, and applications requiring precise optical parameters. The choice depends on your specific measurement needs.

Measurement speed depends on specific applications and accuracy requirements. Single-point measurement is typically completed in milliseconds, providing thickness data instantly. The NS-30 series supports automatic stage scanning with preset measurement paths for batch measurement. For high-speed online monitoring applications, our line-scan equipment can reach thousands of points per second, meeting real-time quality control requirements on production lines.

Yes. Acuitik's equipment supports multi-layer thin film structure analysis. Through inversion algorithms, it can simultaneously analyze the thickness of each layer. Our system can analyze complex thin film structures with 100 or more layers and provide optical parameters such as refractive index and extinction coefficient for each layer. This is very useful for analyzing semiconductor multi-layer structures, complex optical coatings, and coating systems.