Vacuum Environment Measurement Solutions

Vacuum In-situ
Film Thickness Measurement

Providing high-precision in-situ film thickness measurement solutions for real-time monitoring needs during thin film deposition in vacuum environments, supporting various vacuum coating processes such as PVD, CVD, sputtering, and evaporation.

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Vacuum In-situ Measurement

Application Background

During vacuum coating processes, in-situ real-time monitoring of film thickness is crucial for process control and quality assurance

Importance of In-situ Measurement

  • Real-time Process Control

    Monitor film growth in real-time within vacuum chamber to achieve precise process parameter control

  • Improve Yield

    Avoid over-coating or under-coating, significantly improving product yield and production efficiency

  • Reduce Costs

    Reduce material waste, optimize coating time, and improve equipment utilization

Vacuum In-situ Measurement Requirements

Vacuum Compatibility 10⁻⁵ ~ 10⁻⁹ Torr
Thickness Range 0.1 nm - 100 μm
Measurement Accuracy ±0.1 nm

Vacuum In-situ Measurement Solutions

Professional in-situ film thickness monitoring solutions for various vacuum coating processes

Magnetron Sputtering Coating

In-situ film thickness monitoring for magnetron sputtering systems, real-time control of film deposition rate and thickness.

  • Supports DC, AC, RF sputtering
  • Real-time deposition rate monitoring
  • Multi-target simultaneous monitoring

CVD Chemical Vapor Deposition

In-situ film thickness monitoring and process control for chemical vapor deposition processes.

  • High temperature environment compatible
  • Online real-time monitoring
  • Process parameter optimization

ALD Atomic Layer Deposition

Ultra-thin film thickness precision monitoring and control for atomic layer deposition processes.

  • Single atomic layer precision control
  • Self-limiting reaction monitoring
  • Nanometer-level thickness uniformity

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Multi-Point Nano Film Thickness Sensor - OEM Module

Multi-Point Nano Film Thickness Sensor

Multi-Point Nano Film Thickness Sensor

Designed for vacuum deposition processes, supporting PVD/CVD/ALD online monitoring, can be installed horizontally, vertically, or inverted in all directions.

  • Measurement range: 1nm - 500μm
  • Millisecond response, real-time monitoring
  • GEM/SECS 2.0, TCP/IP, C# SDK
  • Easy installation, flexible integration
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