Desktop Automatic Film Thickness Measurement System

NS-30
Automatic Film Thickness Measurement System

Desktop automatic film thickness measurement analysis system with integrated automatic sample stage. Capable of automatic measurement at preset points, generating 2D and 3D distribution maps. Suitable for wafer film thickness measurement and photovoltaic cell film thickness measurement.

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NS-30 High Precision Film Thickness Meter

Key Features

NS-30 integrates Acuitik's most cutting-edge technology, providing unparalleled measurement capabilities for high-end applications

Auto Stage

Integrated automatic sample stage for automated measurement at preset points, improving batch measurement efficiency

Multi-Size Platform

Supports multiple stage sizes from 200mm to 450mm, adaptable to different sample measurement requirements

2D/3D Mapping

Software automatically generates measurement point distributions and displays 2D and 3D maps of thickness, refractive index, and reflectance

AI Enhanced High-Speed

AI-enhanced high-speed measurement capability, reaching over 1,000 points per second, significantly improving production efficiency

High Precision

Measurement repeatability up to 0.05nm, meeting precision R&D requirements

Technical Specifications

Industry-leading specifications for the most demanding applications

Wavelength Range
350-1700nm

Extended spectral range for versatile applications

Measurement Resolution
0.01nm

Ultra-high precision for critical applications

Multi-Layer Capability
Up to 50+ Layers

Complex film stack analysis capability

Measurement Time
0.5-5 seconds

Fast measurements with high precision

Repeatability
σ < 0.005nm

Exceptional stability for consistent results

Spot Size
0.2mm - 10mm

Flexible measurement options

Advanced Applications

Solutions for the most challenging film analysis requirements

Advanced Semiconductors

Ultra-thin gate oxides, high-k dielectrics, and complex multi-layer semiconductor structures

Advanced Optics

Complex optical coatings, laser mirrors, and precision optical filter stacks

Research Laboratories

Novel material research, photonic structures, and metamaterial characterization

MEMS & Sensors

Thin film stress measurement and multi-layer structural analysis in micro-electromechanical systems

graded Index Films

Depth profiling and graded index layer analysis for advanced optical and electronic applications

Metrology Standards

Reference measurement for national and industrial metrology standards development

Product Models

NS-30 series offers three models covering different spectral ranges to meet various film thickness measurement needs

NS-30UV

UV Wavelength Exclusive

Spectral Range 190 nm – 1100 nm
Applicable Wavelength Deep UV to Visible
Recommended Application Nano-scale films, ultra-thin new materials

NS-30

Standard Universal

Spectral Range 380 nm – 1050 nm
Applicable Wavelength Visible to Near-IR
Recommended Application Universal film thickness measurement

NS-30NIR

Near-IR Wavelength

Spectral Range 900 nm – 1700 nm
Applicable Wavelength Near-IR to IR
Recommended Application Thick films, infrared optical materials

Experience Unmatched Precision Today

Contact our team to learn how the NS-30 can transform your film thickness measurement capabilities.

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