Flexible Integration Solution

Multi-point Nano
Film Thickness Sensor

High-precision film thickness sensor supporting multi-point simultaneous measurement, suitable for real-time monitoring of complex thin film processes.

Multi-point Nano Film Thickness Sensor

Core Advantages

Providing high-precision, multi-point simultaneous measurement solutions for complex thin film processes

Compact Design

Compact structure, easy to integrate into various equipment

Easy Installation

Can be installed horizontally, vertically, or inverted, all directions supported

Multi-point Synchronous

Support multiple points measurement simultaneously, real-time full wafer film thickness distribution

Real-time Monitoring

Response time <100ms, supporting 7×24 hour continuous operation

Technical Specifications

High-precision real-time monitoring system for semiconductor-grade production environments

Measurement Performance

Measurement Range 1nm - 500μm
Accuracy ±0.2nm
Response Time <100ms
Sampling Rate Up to 100Hz
Stability <0.1nm/8h

System Specifications

Applicable Processes PVD / CVD / ALD
Wafer Size 6" / 8" / 12"
Window Material Quartz / Sapphire
Mounting CF Flange / KF Port
Operating Temp -20°C ~ 150°C

Communication Interfaces

SECS-I / SECS-II (SEMI E4/E5)
GEM 2.0 / 300mm (SEMI E30)
TCP/IP / RS-232 / RS-485
Analog Output (4-20mA / 0-10V)
Modbus TCP / OPC UA

Physical Specifications

Probe Size Φ60 × 150mm
Controller Size 19" Standard Rack
Power Supply AC 220V, 50Hz
Power Consumption <150W
Vacuum Compatibility 10⁻⁸ Torr

Application Scenarios

Multi-point nano film thickness sensors are widely used in semiconductor, photovoltaic, LED, MEMS and other manufacturing fields

Semiconductor Manufacturing

Photovoltaic Cells

LED Manufacturing

MEMS Devices

Inline Monitoring Equipment

Testing Instruments

Automated Production Lines

Research Applications

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