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The NS-20 series is a desktop manual film thickness measurement and analysis system. While ensuring a compact and lightweight design, its accuracy and stability are in no way compromised. It possesses all the algorithmic software features of the NanoSense series, offering excellent value for money.
NS-20 Features
- Manual measurement with extremely high flexibility
- Standard spot size: 0.8mm ~ 1.5mm
- Capable of upgrading to 0.2mm spot size (NS-20 Pro)
- Customizable portable carrying case for on-the-go film thickness analysis
- Optional large-sized sample stage available
NS-20 Series Specifications
| Model Type | NS-20UV | NS-20 | NS-20NIR |
| Wavelength Range | 190 nm – 1100 nm | 380 nm – 1050 nm | 950 nm – 1700 nm |
| Thickness Measurement Range1 | 1 nm – 40 μm | 15 nm – 80 μm | 150 nm – 250 μm |
| Accuracy2 | 1 nm or 0.2% | 2 nm or 0.2% | 3 nm or 0.4% |
| Precision3 | 0.02 nm | 0.02 nm | 0.1 nm |
| Stability4 | 0.05 nm | 0.05 nm | 0.12 nm |
| Spot Size | 1.5 mm | 1.5 mm | 1.5 mm |
| Measurement Speed | < 1s（Single Measurement), 10ms for F1 algorithm | < 1s（Single Measurement), 10ms for F1 algorithm | < 1s（Single Measurement), 10ms for F1 algorithm |
| Light Source | Halogen + Deuterium Lamp | Halogen Lamp | Halogen Lamp |
| Sample Size | Diameter from 1mm to 300mm or larger | Diameter from 1mm to 300mm or larger | Diameter from 1mm to 300mm or larger |
1.Depends on the specific material
2.Si/SiO2 (500~1000nm) standard film sample
3.Calculate the 1x standard deviation of 100 measurements of a 500nm SiO2 standard wafer, and take the average of the 1x standard deviations over 20 valid measurement days
4.Calculate the average of 100 measurements of a 500nm SiO2 standard wafer, and calculate the 2x standard deviation of the average values over 20 valid measurement days
