SiO2 Refractive Index

Optical constants (n, k) of SiO2, covering 0.03 – 2.20 μm wavelength range.

Range 0.028 – 2.200 μm
Data Points 1904

Optical Constants at Key Wavelengths

632.8 nm (He-Ne)
n = 1.4737
k = 0.0000
589.3 nm (Na-D)
n = 1.4751
k = 0.0000
532 nm
n = 1.4775
k = 0.0000
1550 nm (Telecom)
n = 1.4596
k = 0.0000

n, k Dispersion Curves

Data Table (Sampled)

Wavelength (μm)nk
0.02750.933040.09468
0.03060.925970.10742
0.03420.909870.12337
0.03810.886850.14895
0.04240.855170.18995
0.04720.818700.26470
0.05270.816030.38923
0.05870.884060.51036
0.06540.969920.60351
0.07281.139300.69401
0.08121.226150.64558
0.09041.378860.73119
0.10081.474910.72832
0.11231.750410.59342
0.12512.109770.44110
0.13941.860170.05737
0.15541.707390.00807
0.17311.628220.00220
0.19291.582050.00084
0.21501.552520.00082
0.23961.532190.00081
0.26691.517470.00064
0.29741.506410.00042
0.33141.497890.00024
0.36931.491260.00013
0.41151.486040.00006
0.45861.481890.00003
0.51101.478570.00001
0.56941.475860.00001
0.63451.473610.00000
0.70701.471690.00000
0.78781.470020.00000
0.87781.468490.00000
0.97811.467020.00000
1.08991.465550.00000
1.21451.463980.00000
1.35331.462240.00000
1.50801.460180.00001
1.68041.457660.00007
1.87241.454560.00031
2.08641.450780.00068
2.19991.448510.00080

Sampled data (1904 points total). Click "Download Full CSV" for complete data.

Notes

Film SiO2; Deposited by e-beam evaporation on c-Si at 25 °C; 878.4 nm thick film with a fine polycrystalline structure containing water and organic adsorbed contaminants in pores; Heterogenous data processing combining ellipsometric and spectrophotometric measurements; Room temperature.

References

D. Franta, D. Nečas, I. Ohlídal. A. Giglia. Optical characterization of SiO2 thin films using universal dispersion model over wide spectral range. Proc. SPIE 9890, 989014 (2016) (Numerical data kindly provided by Daniel Franta)

Related Materials (Main)

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