HfO2 Refractive Index

Optical constants (n, k) of HfO2, covering 0.11 – 2.20 μm wavelength range.

Range 0.115 – 2.200 μm
Data Points 1027

Optical Constants at Key Wavelengths

632.8 nm (He-Ne)
n = 2.0877
k = 0.0000
589.3 nm (Na-D)
n = 2.0936
k = 0.0000
532 nm
n = 2.1037
k = 0.0000
1550 nm (Telecom)
n = 2.0521
k = 0.0000

n, k Dispersion Curves

Data Table (Sampled)

Wavelength (μm)nk
0.11481.825571.54494
0.12332.024111.42230
0.13252.150991.29582
0.14242.229561.21139
0.15312.324931.20284
0.16452.567011.21819
0.17672.940090.97397
0.18993.009910.49192
0.20412.826070.17952
0.21932.621640.04160
0.23572.460880.00709
0.25332.365970.00630
0.27222.306160.00930
0.29252.263490.00443
0.31432.226050.00173
0.33772.196920.00114
0.36292.173770.00078
0.39002.154940.00051
0.41912.139410.00028
0.45042.126440.00009
0.48402.115480.00000
0.52012.106290.00000
0.55892.098520.00000
0.60062.091900.00000
0.64542.086220.00000
0.69362.081340.00000
0.74532.077100.00000
0.80092.073400.00000
0.86072.070140.00000
0.92492.067260.00000
0.99392.064670.00000
1.06802.062310.00000
1.14772.060140.00000
1.23342.058100.00000
1.32542.056160.00000
1.42432.054250.00000
1.53052.052360.00000
1.64472.050420.00000
1.76742.048410.00000
1.89932.046280.00000
2.04102.043970.00000
2.19332.041450.00000
2.19962.041340.00000

Sampled data (1027 points total). Click "Download Full CSV" for complete data.

Notes

Film HfO2; Deposited by e-beam evaporation on c-Si; 112.7 nm thick film with an amorphous (very fine polycrystalline) structure; Heterogenous data processing combining ellipsometric and spectrophotometric measurements; Room temperature.

References

D. Franta, D. Nečas, I. Ohlídal. Universal dispersion model for characterization of optical thin films over wide spectral range: Application to hafnia. Appl. Opt. 54, 9108–9119 (2015) (Numerical data kindly provided by Daniel Franta)

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