Precision polarized light analysis technology for ultra-thin film measurement solutions
Polarized light is incident on the sample surface at a specific angle, causing changes in the polarization state of reflected light. By measuring the ellipsometric parameters Ψ and Δ, film thickness, refractive index n, and extinction coefficient k can be precisely calculated.
Polarized light incident on sample surface, changing polarization state of reflected light
Optical constants obtained by measuring ellipsometric parameters Ψ and Δ
Simultaneously measure film thickness, refractive index n, and extinction coefficient k
Ideal for ultra-thin films (<10nm) and complex optical materials
Linearly or elliptically polarized light incident on sample surface at specific angle
Measure polarization state changes of reflected light, obtaining amplitude ratio Ψ and phase difference Δ
Through optical model fitting, calculate film thickness, refractive index, and extinction coefficient
Fully domestic hardware and software with independent intellectual property rights, core technology reaching international advanced level
Core components independently developed with complete IP rights
Measure film thickness, refractive index, n&k values from 1nm to 15μm
Can measure hard, soft, or surface-sensitive samples
Sub-nanometer thickness measurement accuracy, up to 0.05nm
Can measure thickness and optical parameters of each layer in multi-layer composite films
Core patented algorithms, one-click measurement of wide thickness range, greatly simplifies measurement process
Self-developed PolarX analysis software with unique functions such as recipe prediction verification and special material mixing
Static stability up to 0.005nm, stable and reliable measurement results over long-term use
Multi-dimensional thin film analysis functions to meet full-scenario measurement needs from R&D to production
Psi/Delta optimized fitting algorithm for precise film thickness measurement
Using advanced Psi/Delta fitting algorithm, through least squares optimization of objective function, achieving high-precision fitting of ellipsometer measurement data. This algorithm converges quickly, accurately calculating thickness, refractive index, and extinction coefficient for each layer even in complex multi-layer structures.
Built-in Cauchy, EMA, oscillator, and other optical models
Built-in multiple classical optical models, supporting Cauchy model, EMA effective medium approximation, oscillator model, etc., applicable to semiconductor, optical coating, 2D materials and other material systems, meeting measurement needs of different application scenarios.
One-click measurement of samples with multiple thicknesses
Innovative recipe prediction verification function, only one measurement needed to obtain prediction results for multiple thickness samples. Software automatically analyzes spectral characteristics, quickly calculating target thickness range, greatly improving R&D and production efficiency.
Precision measurement of semiconductor ultra-thin films, photoresist, and other nano-scale films
Thickness and optical constant measurement of optical coatings, AR films, high-reflectivity films
Film thickness inspection of OLED, thin-film solar cells, and other flexible devices
Analysis of biofilms, medical coatings, drug release films
Optical characteristics analysis of new optical materials, semiconductor materials
Analysis of hard coatings, decorative coatings, and other functional film layers
Acuitik provides precision measurement solutions based on ellipsometry technology