Measurement Principle
Using high-stability broadband light vertically incident on the sample surface, optical interference occurs between each film layer. The reflected light undergoes spectral analysis and regression algorithms to calculate the thickness of each film layer.
Interference Spectroscopy Technology
Broadband light source provides stable spectral coverage
Multi-layer interference produces characteristic reflection spectra
Regression algorithms precisely calculate layer thickness parameters
Ideal for measuring transparent or semi-transparent layers from nano-scale to micro-scale
Interference Reflection Spectra of Nano Multi-layer Films on Silicon
Nano Multi-layer Film Structure
Interference Reflectance Spectrum Curve
Ellipsometry Technology
Polarized light incident on sample surface, changing polarization state of reflected light
Optical constants obtained by measuring ellipsometric parameters Ψ and Δ
Simultaneously measure film thickness, refractive index n, and extinction coefficient k
Ideal for ultra-thin films (<10nm) and complex optical materials
