Desktop measurement solution specifically designed for thick film detection, covering a wide measurement range from 10μm to 3mm, meeting thick film measurement needs in semiconductor, optics and research fields.
NS-HR series integrates multiple innovative technologies from Acuitik, providing complete solutions for thick film measurement
Covers a wide thickness range from 10μm to 3mm, meeting various thick film measurement needs
Measurement accuracy up to ±0.1%, maintaining excellent measurement stability in thick film measurement
Single point measurement in just 2 seconds, supporting continuous rapid scanning measurement
Three different configurations available to meet different application scenarios and budget requirements
NS-HR Thick Film Gauge offers three different configurations to meet various application needs
NS-HR series provides an extensive measurement range from 10μm to 3mm, meeting various thick film application needs
Minimum measurement thickness
Wide measurement range
Maximum measurement thickness
Detailed technical specifications for NS-HR Thick Film Gauge
| Model | NS-HR980 | NS-HR980 Max | NS-HR1310 | NS-HR1550 | VIS Extension |
|---|---|---|---|---|---|
| Wavelength Range | 960 nm – 1000 nm | 1280 nm – 1340 nm | 1520 nm – 1580 nm | 380 nm – 1050 nm | |
| Thickness Range Refractive Index n=1.5 (Transparent Dielectric) |
10 μm – 1 mm | 15 μm – 2 mm | 25 μm – 3 mm | 15 nm – 100 μm | |
| Thickness Range Refractive Index n=2.6 (SiC) |
6 μm – 600 μm | 9 μm – 1.2 mm | 15 μm – 1.8 mm | 10 nm – 60 μm | |
| Thickness Range Refractive Index n=3.5 (Silicon) |
4 μm – 350 μm | 7 μm – 1 mm | 10 μm – 1.3 mm | 6 nm – 30 μm | |
| Accuracy (Whichever is Greater) | 50 nm or 0.4% | 50 nm or 0.4% | 50 nm or 0.4% | 2 nm or 0.2% | |
| Repeatability1 | 5 nm | 0.02 nm | |||
| Stability2 | 5 nm | 0.05 nm | |||
| Spot Size | 500 μm | 1.5 mm | |||
| Measurement Speed | Optional 1Hz or 1kHz | Optional 1Hz or 1kHz | |||
| Light Source | Halogen Lamp or SLED (Optional) | Halogen Lamp | |||
| Sample Size | Diameter from 1mm to 300mm or larger | ||||
| Parameter | Specification |
|---|---|
| Dimensions | 300mm × 250mm × 350mm |
| Weight | Approx. 8kg |
| Working Distance | 50-100mm |
| Interfaces | USB 3.0, Ethernet |
| Power Supply | AC 100-240V / 50-60Hz |
| Operating Temp | 15°C - 35°C |
| OS | Windows 10/11 |
| SDK Support | C++, C#, Python, LabVIEW |
NS-HR Thick Film Gauge is widely used in various scenarios requiring thick film measurement
Used for measuring silicon wafer thickness, epitaxial layer thickness and other key semiconductor manufacturing parameters to ensure product quality.
Measuring thickness of optical windows, lenses, prisms and other optical components to ensure optical performance meets design requirements.
Providing high-precision thick film measurement capabilities for research institutions and universities to support new material R&D and basic research.
Contact our sales team to learn more about NS-HR Thick Film Gauge and customized solutions